Paper accepted!


The paper I had mentioned earlier went through review and is finally out!

Here, we outline a new process for doing photolithography, with feature control in the third dimension. Instead of just flat layers, we can introduce curvature and periodicity normal to the plane of the wafer.

I began this work during my time with Phoebus and it’s great to see it finished. Particular thanks are due to Gary Bordonaro and Don Tennant, for helping with the day-to-day of getting this done! If you like what you see and are interested, get in touch!

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